item | HPHE/SSPS-SH-2034 |
Silica(SiO2)% | 38-42 |
proportion(20℃,g/cm3) | 1.265-1.3 |
PH(20℃) | 10.0-12.5 |
Viscosity(20℃,mm2/s) | ≤5 |
The average particle size(nm) | 120-140 |
Modified additives | Have |
Stable period (months) | 6 |
Product appearance: milky white;
Product use: suitable for polishing silicon, gallium arsenide and other semiconductor materials, with high purity and fast removal rate;
Note: 1. Packed in 25L\200L\1000L polyethylene plastic barrel, transported and stored in an environment of 0~40℃;
2. Avoid contact with eyes and skin during use. If you accidentally touch it, rinse it off with running water.
WELL-T Service Hotline
+86-0769-83388091WELL-T Business Email
well-t@well-t.com.cnWELL-T Headquarters